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Atomic variations in digital alloy InGaP/InGaAIP multiple quantum wells due to thermal treatment

Authors
Shin, Jae WonJeong, Hu YoungYoo, Seung JoLee, Seok-HoonHan, Jun HeeLee, Jeong YongAhn, Jun SungPark, Chang YoungPark, Kwang WookLee, Yong-TakKim, Jin-GyuKim, Tae Whan
Issue Date
Nov-2014
Publisher
IOP PUBLISHING LTD
Citation
JAPANESE JOURNAL OF APPLIED PHYSICS, v.53, no.11, pp.1 - 5
Indexed
SCIE
SCOPUS
Journal Title
JAPANESE JOURNAL OF APPLIED PHYSICS
Volume
53
Number
11
Start Page
1
End Page
5
URI
https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/158700
DOI
10.7567/JJAP.53.115201
ISSN
0021-4922
Abstract
High-resolution transmission electron microscopy (HRTEM) images showed that the lattice distortion of as-grown InGaP/InGaAIP multiple quantum wells (MQWs) appeared to be due to the small thickness of the alloyed layers, and that their distortion was relaxed owing to the high atomic mobility. High-angle annular dark-field scanning transmission electron microscopy images demonstrated that the chemical intermixing of Ga and Al atoms between the InAlP and InGaP alloy layers due to thermal annealing relaxed the stress of the InGaAIP layer. The atomic arrangements of the as-grown and annealed MQWs are described on the basis of the experimental results.
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