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Stabilized resistive switching behaviors of a Pt/TaOx/TiN RRAM under different oxygen contents

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dc.contributor.authorJeon, Heeyoung-
dc.contributor.authorPark, Jingyu-
dc.contributor.authorJang, Woochool-
dc.contributor.authorKim, Hyunjung-
dc.contributor.authorKang, Chunho-
dc.contributor.authorSong, Hyoseok-
dc.contributor.authorKim, Honggi-
dc.contributor.authorSeo, Hyungtak-
dc.contributor.authorJeon, Hyeongtag-
dc.date.accessioned2022-07-16T03:09:59Z-
dc.date.available2022-07-16T03:09:59Z-
dc.date.issued2014-09-
dc.identifier.issn1862-6300-
dc.identifier.issn1862-6319-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/159225-
dc.description.abstractWe demonstrate enhanced resistive switching (RS) stability, as measured by distribution, power consumption, and memory window, using different oxygen contents in a Ta oxide (TaOx) layer with a Pt top electrode and a TiN bottom electrode. The stability of the Pt/TaOx/TiN RRAM device increases as the oxygen contents of the TaOx layer increase. When oxygen is introduced during TaOx deposition, conventional bipolar RS (BRS) switches to self-compliant BRS, and distribution is improved within 200 repeated RS cycles. We investigate the conduction mechanisms for both a low resistance state (LRS) and a high resistance state (HRS). Ohmic conduction in the LRS and for the low bias region in the HRS corresponds to the conductive filament (CF) theory, while Poole-Frenkel (PF) conduction in the high bias region of HRS is the dominant conduction mechanism. A possible RS mechanism with oxygen ion drift is discussed.-
dc.format.extent6-
dc.language영어-
dc.language.isoENG-
dc.publisherWiley - V C H Verlag GmbbH & Co.-
dc.titleStabilized resistive switching behaviors of a Pt/TaOx/TiN RRAM under different oxygen contents-
dc.typeArticle-
dc.publisher.location독일-
dc.identifier.doi10.1002/pssa.201431260-
dc.identifier.scopusid2-s2.0-85027949562-
dc.identifier.wosid000341988400039-
dc.identifier.bibliographicCitationphysica status solidi (a) - applications and materials science, v.211, no.9, pp 2189 - 2194-
dc.citation.titlephysica status solidi (a) - applications and materials science-
dc.citation.volume211-
dc.citation.number9-
dc.citation.startPage2189-
dc.citation.endPage2194-
dc.type.docTypeArticle-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClasssci-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.relation.journalWebOfScienceCategoryPhysics, Condensed Matter-
dc.subject.keywordPlusDEVICES-
dc.subject.keywordPlusTIN-
dc.subject.keywordAuthorcontacts-
dc.subject.keywordAuthorresistive switching-
dc.subject.keywordAuthorRRAM-
dc.subject.keywordAuthorTaOx-
dc.identifier.urlhttps://onlinelibrary.wiley.com/doi/10.1002/pssa.201431260-
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