Stabilized resistive switching behaviors of a Pt/TaOx/TiN RRAM under different oxygen contents
- Authors
- Jeon, Heeyoung; Park, Jingyu; Jang, Woochool; Kim, Hyunjung; Kang, Chunho; Song, Hyoseok; Kim, Honggi; Seo, Hyungtak; Jeon, Hyeongtag
- Issue Date
- Sep-2014
- Publisher
- Wiley - V C H Verlag GmbbH & Co.
- Keywords
- contacts; resistive switching; RRAM; TaOx
- Citation
- physica status solidi (a) - applications and materials science, v.211, no.9, pp 2189 - 2194
- Pages
- 6
- Indexed
- SCI
SCIE
SCOPUS
- Journal Title
- physica status solidi (a) - applications and materials science
- Volume
- 211
- Number
- 9
- Start Page
- 2189
- End Page
- 2194
- URI
- https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/159225
- DOI
- 10.1002/pssa.201431260
- ISSN
- 1862-6300
1862-6319
- Abstract
- We demonstrate enhanced resistive switching (RS) stability, as measured by distribution, power consumption, and memory window, using different oxygen contents in a Ta oxide (TaOx) layer with a Pt top electrode and a TiN bottom electrode. The stability of the Pt/TaOx/TiN RRAM device increases as the oxygen contents of the TaOx layer increase. When oxygen is introduced during TaOx deposition, conventional bipolar RS (BRS) switches to self-compliant BRS, and distribution is improved within 200 repeated RS cycles. We investigate the conduction mechanisms for both a low resistance state (LRS) and a high resistance state (HRS). Ohmic conduction in the LRS and for the low bias region in the HRS corresponds to the conductive filament (CF) theory, while Poole-Frenkel (PF) conduction in the high bias region of HRS is the dominant conduction mechanism. A possible RS mechanism with oxygen ion drift is discussed.
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