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Stabilized resistive switching behaviors of a Pt/TaOx/TiN RRAM under different oxygen contents

Authors
Jeon, HeeyoungPark, JingyuJang, WoochoolKim, HyunjungKang, ChunhoSong, HyoseokKim, HonggiSeo, HyungtakJeon, Hyeongtag
Issue Date
Sep-2014
Publisher
Wiley - V C H Verlag GmbbH & Co.
Keywords
contacts; resistive switching; RRAM; TaOx
Citation
physica status solidi (a) - applications and materials science, v.211, no.9, pp 2189 - 2194
Pages
6
Indexed
SCI
SCIE
SCOPUS
Journal Title
physica status solidi (a) - applications and materials science
Volume
211
Number
9
Start Page
2189
End Page
2194
URI
https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/159225
DOI
10.1002/pssa.201431260
ISSN
1862-6300
1862-6319
Abstract
We demonstrate enhanced resistive switching (RS) stability, as measured by distribution, power consumption, and memory window, using different oxygen contents in a Ta oxide (TaOx) layer with a Pt top electrode and a TiN bottom electrode. The stability of the Pt/TaOx/TiN RRAM device increases as the oxygen contents of the TaOx layer increase. When oxygen is introduced during TaOx deposition, conventional bipolar RS (BRS) switches to self-compliant BRS, and distribution is improved within 200 repeated RS cycles. We investigate the conduction mechanisms for both a low resistance state (LRS) and a high resistance state (HRS). Ohmic conduction in the LRS and for the low bias region in the HRS corresponds to the conductive filament (CF) theory, while Poole-Frenkel (PF) conduction in the high bias region of HRS is the dominant conduction mechanism. A possible RS mechanism with oxygen ion drift is discussed.
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