Characterization of nano-scale strained silicon-on-insulator substrates by multi-wavelength high resolution micro-raman and optical reflectance
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Shim, Tae-Hun | - |
dc.contributor.author | Lee, Du-Yeong | - |
dc.contributor.author | Kim, Tae-Hyun | - |
dc.contributor.author | Park, Jea-Gun | - |
dc.date.accessioned | 2022-07-16T06:12:08Z | - |
dc.date.available | 2022-07-16T06:12:08Z | - |
dc.date.created | 2021-05-12 | - |
dc.date.issued | 2014-02 | - |
dc.identifier.issn | 1229-9162 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/160756 | - |
dc.description.abstract | Strained silicon-on-insulator (sSOI) substrates were characterized using multi-wavelength, high resolution, polychromator-based micro Raman spectroscopy and normal incidence optical reflectance spectra measurement. Significant Raman shifts towards the lower wavenumber side, corresponding to tensile stress, and broadening of the Raman peak in sSOI thin films were observed. The stress and crystallinity of sSOI were characterized from the shift and full-width-at-half-maximum data. The thickness of strained Si and buried oxide film of sSOI was estimated from the optical reflectance. Multi-wavelength Raman and optical reflectance measurement, when used together provide a useful and practical non-destructive stress, and structural characterization technique for nano-scale sSOI. | - |
dc.language | 영어 | - |
dc.language.iso | en | - |
dc.publisher | KOREAN ASSOC CRYSTAL GROWTH, INC | - |
dc.title | Characterization of nano-scale strained silicon-on-insulator substrates by multi-wavelength high resolution micro-raman and optical reflectance | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Park, Jea-Gun | - |
dc.identifier.doi | 10.36410/jcpr.2014.15.1.53 | - |
dc.identifier.scopusid | 2-s2.0-84897409329 | - |
dc.identifier.wosid | 000335968400012 | - |
dc.identifier.bibliographicCitation | JOURNAL OF CERAMIC PROCESSING RESEARCH, v.15, no.1, pp.53 - 56 | - |
dc.relation.isPartOf | JOURNAL OF CERAMIC PROCESSING RESEARCH | - |
dc.citation.title | JOURNAL OF CERAMIC PROCESSING RESEARCH | - |
dc.citation.volume | 15 | - |
dc.citation.number | 1 | - |
dc.citation.startPage | 53 | - |
dc.citation.endPage | 56 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.identifier.kciid | ART002328319 | - |
dc.description.journalClass | 1 | - |
dc.description.isOpenAccess | N | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.description.journalRegisteredClass | kci | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Ceramics | - |
dc.subject.keywordPlus | SPECTROSCOPY | - |
dc.subject.keywordPlus | SI | - |
dc.subject.keywordAuthor | Strained Si | - |
dc.subject.keywordAuthor | sSOI | - |
dc.subject.keywordAuthor | SOI | - |
dc.subject.keywordAuthor | Multi-wavelength | - |
dc.subject.keywordAuthor | Raman | - |
dc.subject.keywordAuthor | Reflectance | - |
dc.subject.keywordAuthor | Strain | - |
dc.identifier.url | https://www.kci.go.kr/kciportal/landing/article.kci?arti_id=ART002328319 | - |
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
222, Wangsimni-ro, Seongdong-gu, Seoul, 04763, Korea+82-2-2220-1365
COPYRIGHT © 2021 HANYANG UNIVERSITY.
Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.
You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.