Method for measurement of transferred power to plasma in inductive discharges
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Hwang, Hye-Ju | - |
dc.contributor.author | Kim, Young-Cheol | - |
dc.contributor.author | Chung, Chin-Wook | - |
dc.date.accessioned | 2022-07-16T07:42:24Z | - |
dc.date.available | 2022-07-16T07:42:24Z | - |
dc.date.created | 2021-05-12 | - |
dc.date.issued | 2013-11 | - |
dc.identifier.issn | 0040-6090 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/161610 | - |
dc.description.abstract | A method for measuring a transferred power to plasma is proposed in an inductively coupled plasma. Antenna currents are monitored when the plasma is turned on at a certain input power. The transferred power can be obtained by subtraction of the power at the same current when the plasma is turned off without inert gas, to the input power. This method is compared to the conventional method against various input powers and it is in good agreement. The circuit analysis of an impedance matching network is also discussed in this work. | - |
dc.language | 영어 | - |
dc.language.iso | en | - |
dc.publisher | ELSEVIER SCIENCE SA | - |
dc.title | Method for measurement of transferred power to plasma in inductive discharges | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Chung, Chin-Wook | - |
dc.identifier.doi | 10.1016/j.tsf.2013.05.114 | - |
dc.identifier.scopusid | 2-s2.0-84886792403 | - |
dc.identifier.wosid | 000326036100003 | - |
dc.identifier.bibliographicCitation | THIN SOLID FILMS, v.547, pp.9 - 12 | - |
dc.relation.isPartOf | THIN SOLID FILMS | - |
dc.citation.title | THIN SOLID FILMS | - |
dc.citation.volume | 547 | - |
dc.citation.startPage | 9 | - |
dc.citation.endPage | 12 | - |
dc.type.rims | ART | - |
dc.type.docType | Article; Proceedings Paper | - |
dc.description.journalClass | 1 | - |
dc.description.isOpenAccess | N | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Coatings & Films | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.relation.journalWebOfScienceCategory | Physics, Condensed Matter | - |
dc.subject.keywordPlus | COUPLED PLASMAS | - |
dc.subject.keywordPlus | EFFICIENCY | - |
dc.subject.keywordAuthor | Inductively coupled plasma | - |
dc.subject.keywordAuthor | Power transfer efficiency | - |
dc.subject.keywordAuthor | Dissipated power in system | - |
dc.identifier.url | https://www.sciencedirect.com/science/article/pii/S0040609013009589?via%3Dihub | - |
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
222, Wangsimni-ro, Seongdong-gu, Seoul, 04763, Korea+82-2-2220-1365
COPYRIGHT © 2021 HANYANG UNIVERSITY.
Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.
You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.