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Method for measurement of transferred power to plasma in inductive discharges
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Hwang, Hye-Ju | - |
| dc.contributor.author | Kim, Young-Cheol | - |
| dc.contributor.author | Chung, Chin-Wook | - |
| dc.date.accessioned | 2022-07-16T07:42:24Z | - |
| dc.date.available | 2022-07-16T07:42:24Z | - |
| dc.date.issued | 2013-11 | - |
| dc.identifier.issn | 0040-6090 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/161610 | - |
| dc.description.abstract | A method for measuring a transferred power to plasma is proposed in an inductively coupled plasma. Antenna currents are monitored when the plasma is turned on at a certain input power. The transferred power can be obtained by subtraction of the power at the same current when the plasma is turned off without inert gas, to the input power. This method is compared to the conventional method against various input powers and it is in good agreement. The circuit analysis of an impedance matching network is also discussed in this work. | - |
| dc.format.extent | 4 | - |
| dc.language | 영어 | - |
| dc.language.iso | ENG | - |
| dc.publisher | Elsevier Sequoia | - |
| dc.title | Method for measurement of transferred power to plasma in inductive discharges | - |
| dc.type | Article | - |
| dc.publisher.location | 스위스 | - |
| dc.identifier.doi | 10.1016/j.tsf.2013.05.114 | - |
| dc.identifier.scopusid | 2-s2.0-84886792403 | - |
| dc.identifier.wosid | 000326036100003 | - |
| dc.identifier.bibliographicCitation | Thin Solid Films, v.547, pp 9 - 12 | - |
| dc.citation.title | Thin Solid Films | - |
| dc.citation.volume | 547 | - |
| dc.citation.startPage | 9 | - |
| dc.citation.endPage | 12 | - |
| dc.type.docType | Article; Proceedings Paper | - |
| dc.description.isOpenAccess | N | - |
| dc.description.journalRegisteredClass | sci | - |
| dc.description.journalRegisteredClass | scie | - |
| dc.description.journalRegisteredClass | scopus | - |
| dc.relation.journalResearchArea | Materials Science | - |
| dc.relation.journalResearchArea | Physics | - |
| dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
| dc.relation.journalWebOfScienceCategory | Materials Science, Coatings & Films | - |
| dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
| dc.relation.journalWebOfScienceCategory | Physics, Condensed Matter | - |
| dc.subject.keywordPlus | COUPLED PLASMAS | - |
| dc.subject.keywordPlus | EFFICIENCY | - |
| dc.subject.keywordAuthor | Inductively coupled plasma | - |
| dc.subject.keywordAuthor | Power transfer efficiency | - |
| dc.subject.keywordAuthor | Dissipated power in system | - |
| dc.identifier.url | https://www.sciencedirect.com/science/article/pii/S0040609013009589?via%3Dihub | - |
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Related Researcher
- Chung, Chin Wook
- COLLEGE OF ENGINEERING (MAJOR IN ELECTRICAL ENGINEERING)