On the plasma uniformity of multi-electrode CCPs for large-area processing
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Jung, Park Gi | - |
dc.contributor.author | Hoon, Seo Sang | - |
dc.contributor.author | Wook, Chung Chin | - |
dc.contributor.author | Young, Chang Hong | - |
dc.date.accessioned | 2022-07-16T08:16:37Z | - |
dc.date.available | 2022-07-16T08:16:37Z | - |
dc.date.created | 2021-05-11 | - |
dc.date.issued | 2013-10 | - |
dc.identifier.issn | 0963-0252 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/161891 | - |
dc.description.abstract | In this work, we attempt to overcome the problem of non-uniformity of large-area capacitively coupled plasmas. We select a multi-electrode concept and construct a system with two concentric electrodes. In the two-circuit model, both electrodes have the same area. The plasma of this system is measured by a two-dimensional probe array. We measure the plasma in the large-area chamber that has the multi-electrode. We reduce the non-uniformity to almost 3% and investigate the conditions of a uniform plasma. | - |
dc.language | 영어 | - |
dc.language.iso | en | - |
dc.publisher | IOP PUBLISHING LTD | - |
dc.title | On the plasma uniformity of multi-electrode CCPs for large-area processing | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Wook, Chung Chin | - |
dc.identifier.doi | 10.1088/0963-0252/22/5/055005 | - |
dc.identifier.scopusid | 2-s2.0-84885391230 | - |
dc.identifier.wosid | 000325246400005 | - |
dc.identifier.bibliographicCitation | PLASMA SOURCES SCIENCE & TECHNOLOGY, v.22, no.5, pp.1 - 8 | - |
dc.relation.isPartOf | PLASMA SOURCES SCIENCE & TECHNOLOGY | - |
dc.citation.title | PLASMA SOURCES SCIENCE & TECHNOLOGY | - |
dc.citation.volume | 22 | - |
dc.citation.number | 5 | - |
dc.citation.startPage | 1 | - |
dc.citation.endPage | 8 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.isOpenAccess | N | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Physics, Fluids & Plasmas | - |
dc.subject.keywordPlus | HIGH-FREQUENCY | - |
dc.subject.keywordPlus | STANDING-WAVE | - |
dc.subject.keywordPlus | ELECTRODE | - |
dc.identifier.url | https://iopscience.iop.org/article/10.1088/0963-0252/22/5/055005 | - |
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