Very Thin Extreme Ultraviolet Mask Absorber Material for Extremely Fine Pitch Patterning
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Lee, Jae Uk | - |
dc.contributor.author | Hong, Seongchul | - |
dc.contributor.author | Ahn, Jinho | - |
dc.date.accessioned | 2022-07-16T09:12:15Z | - |
dc.date.available | 2022-07-16T09:12:15Z | - |
dc.date.created | 2021-05-12 | - |
dc.date.issued | 2013-07 | - |
dc.identifier.issn | 1882-0778 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/162398 | - |
dc.description.abstract | In this report, we propose palladium oxide (PdO) as an absorber material 14 nm. In our simulations, because of its low refractive index (n = 0.8634) and high extinction coefficient (k = 0.0536), an attenuated phase shift mask with a very thin (similar to 20 nm) PdO absorber can provide an EUV contrast as high as 88% at a 14 nm half pitch under dipole illumination. This results in a very limited horizontal-vertical critical dimension bias (<= 2.6 nm) and a sufficiently high normalized image log slope (>= 2.78) down to a 14 nm half pitch. | - |
dc.language | 영어 | - |
dc.language.iso | en | - |
dc.publisher | IOP PUBLISHING LTD | - |
dc.title | Very Thin Extreme Ultraviolet Mask Absorber Material for Extremely Fine Pitch Patterning | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Ahn, Jinho | - |
dc.identifier.doi | 10.7567/APEX.6.076502 | - |
dc.identifier.scopusid | 2-s2.0-84880845597 | - |
dc.identifier.wosid | 000321699300043 | - |
dc.identifier.bibliographicCitation | APPLIED PHYSICS EXPRESS, v.6, no.7, pp.1 - 4 | - |
dc.relation.isPartOf | APPLIED PHYSICS EXPRESS | - |
dc.citation.title | APPLIED PHYSICS EXPRESS | - |
dc.citation.volume | 6 | - |
dc.citation.number | 7 | - |
dc.citation.startPage | 1 | - |
dc.citation.endPage | 4 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.isOpenAccess | N | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.subject.keywordPlus | PHASE-SHIFTING MASKS | - |
dc.subject.keywordPlus | EUV WAVELENGTHS | - |
dc.subject.keywordPlus | ARF LITHOGRAPHY | - |
dc.subject.keywordPlus | PRINTABILITY | - |
dc.subject.keywordPlus | SIMULATION | - |
dc.subject.keywordPlus | FLARE | - |
dc.subject.keywordPlus | ANGLE | - |
dc.identifier.url | https://iopscience.iop.org/article/10.7567/APEX.6.076502 | - |
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