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Local stress distribution in GaN vertical light-emitting diodes fabricated using CLO and LLO methods

Authors
Park, JinsubGoto, TakenariYao, TakafumiLee, SeogwooCho, Moungwhan
Issue Date
Apr-2013
Publisher
IOP PUBLISHING LTD
Citation
JOURNAL OF PHYSICS D-APPLIED PHYSICS, v.46, no.15, pp.1 - 5
Indexed
SCIE
SCOPUS
Journal Title
JOURNAL OF PHYSICS D-APPLIED PHYSICS
Volume
46
Number
15
Start Page
1
End Page
5
URI
https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/163121
DOI
10.1088/0022-3727/46/15/155104
ISSN
0022-3727
Abstract
We report on the local stress distribution in a GaN-based vertical light-emitting diode (V-LED) fabricated using two types of separation methods: a chemical lift-off (CLO) procedure and a laser lift-off (LLO) technique. The CLO LED exhibits a stronger donor-bound exciton ((DX)-X-0) emission than the LLO LED, owing to its textured surface morphology and lower amount of damage to the structure. On the basis of the photoluminescence and Raman spectroscopy results, we determine that the CLO GaN LED has an 82MPa lower residual stress than the LLO GaN LED. Therefore, the CLO technique can be considered as a more effective method to fabricate stress-relieved high-brightness LEDs.
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