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Fast response time patterned vertical alignment mode using double step UV exposure
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Kim, Dong-Ha | - |
| dc.contributor.author | Kim, Youngsik | - |
| dc.contributor.author | Lee, Jae Ho | - |
| dc.contributor.author | Lee, You-Jin | - |
| dc.contributor.author | Yu, Chang‐Jae | - |
| dc.contributor.author | Kim, Jae-Hoon | - |
| dc.date.accessioned | 2022-07-16T12:18:03Z | - |
| dc.date.available | 2022-07-16T12:18:03Z | - |
| dc.date.created | 2021-05-13 | - |
| dc.date.issued | 2012-12 | - |
| dc.identifier.issn | 1883-2490 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/164016 | - |
| dc.description.abstract | We propose an advanced patterned vertical alignment (PVA) mode with a fast response time through double ultraviolet (UV) exposure to UV curable reactive mesogen (RM) mixed in alignment layer. The double step UV exposures using a photomask divide an active pixel region into two regions with a modified pretilt region and a high elastics deformation energy one. | - |
| dc.language | 영어 | - |
| dc.language.iso | en | - |
| dc.publisher | IEEE | - |
| dc.title | Fast response time patterned vertical alignment mode using double step UV exposure | - |
| dc.type | Article | - |
| dc.contributor.affiliatedAuthor | Yu, Chang‐Jae | - |
| dc.contributor.affiliatedAuthor | Kim, Jae-Hoon | - |
| dc.identifier.scopusid | 2-s2.0-84885936292 | - |
| dc.identifier.bibliographicCitation | Proceedings of the International Display Workshops, v.1, pp.123 - 125 | - |
| dc.relation.isPartOf | Proceedings of the International Display Workshops | - |
| dc.citation.title | Proceedings of the International Display Workshops | - |
| dc.citation.volume | 1 | - |
| dc.citation.startPage | 123 | - |
| dc.citation.endPage | 125 | - |
| dc.type.rims | ART | - |
| dc.type.docType | Conference Paper | - |
| dc.description.journalClass | 1 | - |
| dc.description.isOpenAccess | N | - |
| dc.description.journalRegisteredClass | scopus | - |
| dc.subject.keywordPlus | Active pixel | - |
| dc.subject.keywordPlus | Alignment layers | - |
| dc.subject.keywordPlus | Deformation energy | - |
| dc.subject.keywordPlus | Double-step | - |
| dc.subject.keywordPlus | Fast response time | - |
| dc.subject.keywordPlus | Patterned vertical alignment | - |
| dc.subject.keywordPlus | Reactive mesogen | - |
| dc.subject.keywordPlus | Ultraviolet exposure | - |
| dc.identifier.url | https://pdfs.semanticscholar.org/5ff8/5e3a60c4ce1376cf1c52df7bd7e59eedcf11.pdf | - |
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Related Researcher
- Kim, Jae Hoon
- COLLEGE OF ENGINEERING (SCHOOL OF ELECTRONIC ENGINEERING)