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Fast response time patterned vertical alignment mode using double step UV exposure
- Issue Date
- Dec-2012
- Publisher
- IEEE
- Citation
- Proceedings of the International Display Workshops, v.1, pp.123 - 125
- Indexed
- SCOPUS
- Journal Title
- Proceedings of the International Display Workshops
- Volume
- 1
- Start Page
- 123
- End Page
- 125
- ISSN
- 1883-2490
- Abstract
- We propose an advanced patterned vertical alignment (PVA) mode with a fast response time through double ultraviolet (UV) exposure to UV curable reactive mesogen (RM) mixed in alignment layer. The double step UV exposures using a photomask divide an active pixel region into two regions with a modified pretilt region and a high elastics deformation energy one.
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Related Researcher
- Yu, Chang Jae
- COLLEGE OF ENGINEERING (SCHOOL OF ELECTRONIC ENGINEERING)