Detailed Information

Cited 0 time in webofscience Cited 0 time in scopus
Metadata Downloads

High polishing selectivity ceria slurry for formation of top electrode in spin-transfer torque magnetic random access memory

Full metadata record
DC Field Value Language
dc.contributor.authorCui, Hao-
dc.contributor.authorLim, Jae-Hyung-
dc.contributor.authorPark, Jin-Hyung-
dc.contributor.authorPark, Jea-Gun-
dc.date.accessioned2022-07-16T12:58:45Z-
dc.date.available2022-07-16T12:58:45Z-
dc.date.created2021-05-12-
dc.date.issued2012-11-
dc.identifier.issn0040-6090-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/164315-
dc.description.abstractDuring the formation of the top electrode (T. E.) in spin-transfer torque magnetic random access memory, a slurry with a high polishing rate of SiO2 and a low polishing rate of metal (T. E. material) is required in the chemical mechanical planarization application area. We used a ceria-based slurry with a polymeric additive to maintain the high polishing rate of SiO2 while it suppresses the polishing rate of the T. E. material, tantalum and ruthenium. We found ruthenium showed a significantly higher selectivity than tantalum in the ceria-based slurry. X-ray photoelectron spectroscopy was used to investigate the adsorption characteristics of the polymeric additive on the T. E. material. Except for the adsorbed polymeric additive, we found that zeta potential of the T. E. material played a critical role in determining the polishing selectivity of SiO2-to-T.E. material.-
dc.language영어-
dc.language.isoen-
dc.publisherELSEVIER SCIENCE SA-
dc.titleHigh polishing selectivity ceria slurry for formation of top electrode in spin-transfer torque magnetic random access memory-
dc.typeArticle-
dc.contributor.affiliatedAuthorPark, Jea-Gun-
dc.identifier.doi10.1016/j.tsf.2012.09.044-
dc.identifier.scopusid2-s2.0-84868544358-
dc.identifier.wosid000310782000041-
dc.identifier.bibliographicCitationTHIN SOLID FILMS, v.522, pp.212 - 216-
dc.relation.isPartOfTHIN SOLID FILMS-
dc.citation.titleTHIN SOLID FILMS-
dc.citation.volume522-
dc.citation.startPage212-
dc.citation.endPage216-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryMaterials Science, Coatings & Films-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.relation.journalWebOfScienceCategoryPhysics, Condensed Matter-
dc.subject.keywordPlusDIFFUSION BARRIER-
dc.subject.keywordPlusBEHAVIOR-
dc.subject.keywordAuthorSpin-transfer torque magnetic random access memory-
dc.subject.keywordAuthorChemical mechanical polishing-
dc.subject.keywordAuthorRuthenium-
dc.subject.keywordAuthorTantalum-
dc.subject.keywordAuthorPoly(acrylamide)-
dc.subject.keywordAuthorCeria-
dc.subject.keywordAuthorZeta potential-
dc.identifier.urlhttps://www.sciencedirect.com/science/article/pii/S0040609012011595?via%3Dihub-
Files in This Item
Go to Link
Appears in
Collections
서울 공과대학 > 서울 융합전자공학부 > 1. Journal Articles

qrcode

Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.

Related Researcher

Researcher Park, Jea  Gun photo

Park, Jea Gun
COLLEGE OF ENGINEERING (SCHOOL OF ELECTRONIC ENGINEERING)
Read more

Altmetrics

Total Views & Downloads

BROWSE