Fabrication of on-chip fluidic channels incorporating nanopores using self-aligned double layer resist processing technique
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kim, Bongho | - |
dc.contributor.author | Kwon, Jihun | - |
dc.contributor.author | Kim, Daehong | - |
dc.contributor.author | Chun, Sungwoo | - |
dc.contributor.author | Lee, Hyungyu | - |
dc.contributor.author | Lee, Seung-Beck | - |
dc.date.accessioned | 2022-07-16T13:00:11Z | - |
dc.date.available | 2022-07-16T13:00:11Z | - |
dc.date.created | 2021-05-12 | - |
dc.date.issued | 2012-11 | - |
dc.identifier.issn | 1071-1023 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/164331 | - |
dc.description.abstract | The authors report on the development of a self-aligned double layer resist processing technique that allows incorporation of ion channel nanopores into on-chip microfluidic channels. The patterned positive/negative electron-beam resist double layer acts as a sacrificial template for the fabrication of on-chip fluidic channels and the nanopores. By controlling the resist dimensions, it was possible to tailor the shape of the on-chip fluidic channel and the nanopore dimensions. Using this technique, the authors demonstrated the fabrication of sub-10 nm nanopore arrays on 2 mu m wide and 800nm high on-chip fluidic channels. With further developments, it will be possible to have controllable on-chip nanopores with integrated nanofluidics. | - |
dc.language | 영어 | - |
dc.language.iso | en | - |
dc.publisher | A V S AMER INST PHYSICS | - |
dc.title | Fabrication of on-chip fluidic channels incorporating nanopores using self-aligned double layer resist processing technique | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Lee, Seung-Beck | - |
dc.identifier.doi | 10.1116/1.4767234 | - |
dc.identifier.scopusid | 2-s2.0-84870382999 | - |
dc.identifier.wosid | 000311667300031 | - |
dc.identifier.bibliographicCitation | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, v.30, no.6, pp.1 - 4 | - |
dc.relation.isPartOf | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | - |
dc.citation.title | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | - |
dc.citation.volume | 30 | - |
dc.citation.number | 6 | - |
dc.citation.startPage | 1 | - |
dc.citation.endPage | 4 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.isOpenAccess | N | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Engineering | - |
dc.relation.journalResearchArea | Science & Technology - Other Topics | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Engineering, Electrical & Electronic | - |
dc.relation.journalWebOfScienceCategory | Nanoscience & Nanotechnology | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.subject.keywordPlus | Fabrication | - |
dc.subject.keywordPlus | Fluidic devices | - |
dc.identifier.url | https://avs.scitation.org/doi/10.1116/1.4767234 | - |
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