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수소 환원 공정과 실리콘 확산 침투 처리 공정을 통한 이규화 몰리브덴 코팅층 형성Formation of MoSi2 Layer by Hydrogen Reduction and Si-pack Cementation
- Other Titles
- Formation of MoSi2 Layer by Hydrogen Reduction and Si-pack Cementation
- Issue Date
- Sep-2012
- Publisher
- 대한금속·재료학회
- Keywords
- thin films; coating; diffusion; scanning electron microscopy (SEM); hydrogen reduction
- Citation
- 대한금속·재료학회지, v.50, no.9, pp 653 - 657
- Pages
- 5
- Indexed
- SCIE
SCOPUS
KCI
- Journal Title
- 대한금속·재료학회지
- Volume
- 50
- Number
- 9
- Start Page
- 653
- End Page
- 657
- ISSN
- 1738-8228
2288-8241
- Abstract
- In this study, a molybdenum disilicide (MoSi2) coating process was investigated by hydrogen reduction and Si-pack cementation. At first, the metallic Mo coating was carried out by hydrogen reduction of MoO3 powder at 750 degrees C for various holding times (1, 2, 3 h) in hydrogen atmosphere. A 4.3 mu m thick metallic molybdenum thin film was formed at 3 h. MoSi2 was obtained by Si-pack cementation on molybdenum thin film through hydrogen reduction processing. It was carried out using Si : Al(2)0(3) : NH4Cl = 5 : 92 : 3 (wt%) packs at 900 degrees C for various holding times (30, 60, 90 min) in Ar atmosphere. When the holding time was 90 min, a MoSi2 layer was coated successfully and a 15.4 mu m thickness was observed.
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Collections - 서울 공과대학 > 서울 신소재공학부 > 1. Journal Articles
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