수소 환원 공정과 실리콘 확산 침투 처리 공정을 통한 이규화 몰리브덴 코팅층 형성Formation of MoSi2 Layer by Hydrogen Reduction and Si-pack Cementation
- Other Titles
- Formation of MoSi2 Layer by Hydrogen Reduction and Si-pack Cementation
- Authors
- Jeon, In Mok; Byun, Jong Min; Kim, Se Hoon; Kim, Jin Woo; Kim, Young Do
- Issue Date
- Sep-2012
- Publisher
- KOREAN INST METALS MATERIALS
- Keywords
- thin films; coating; diffusion; scanning electron microscopy (SEM); hydrogen reduction
- Citation
- Korean Journal of Metal and Materials, v.50, no.9, pp.653 - 657
- Indexed
- SCIE
SCOPUS
KCI
- Journal Title
- Korean Journal of Metal and Materials
- Volume
- 50
- Number
- 9
- Start Page
- 653
- End Page
- 657
- URI
- https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/164813
- DOI
- 10.3365/KJMM.2012.50.9.653
- ISSN
- 1738-8228
- Abstract
- In this study, a molybdenum disilicide (MoSi2) coating process was investigated by hydrogen reduction and Si-pack cementation. At first, the metallic Mo coating was carried out by hydrogen reduction of MoO3 powder at 750 degrees C for various holding times (1, 2, 3 h) in hydrogen atmosphere. A 4.3 mu m thick metallic molybdenum thin film was formed at 3 h. MoSi2 was obtained by Si-pack cementation on molybdenum thin film through hydrogen reduction processing. It was carried out using Si : Al(2)0(3) : NH4Cl = 5 : 92 : 3 (wt%) packs at 900 degrees C for various holding times (30, 60, 90 min) in Ar atmosphere. When the holding time was 90 min, a MoSi2 layer was coated successfully and a 15.4 mu m thickness was observed.
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