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Atomic Layer Deposition of Indium Gallium Zinc Oxide (IGZO) Semiconductor Thin Films: From Precursor to Thin Film Transistor Application

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dc.contributor.author박진성-
dc.date.accessioned2021-08-02T12:58:34Z-
dc.date.available2021-08-02T12:58:34Z-
dc.date.issued2019-07-23-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/16492-
dc.titleAtomic Layer Deposition of Indium Gallium Zinc Oxide (IGZO) Semiconductor Thin Films: From Precursor to Thin Film Transistor Application-
dc.typeConference-
dc.citation.conferenceName19th International Conference on Atomic Layer Deposition-
dc.citation.conferencePlaceNellevue, Washington, USA-
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