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Effect of Molecular Weight of Polyvinylpyrrolidone on Corrosion-Inhibition Efficiency of Polycrystalline Ge2Sb2Te5 Film

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dc.contributor.authorCho, Jong-Young-
dc.contributor.authorYi, Sok-Ho-
dc.contributor.authorPark, Jin-Hyung-
dc.contributor.authorPark, Jea-Gun-
dc.date.accessioned2022-07-16T17:08:06Z-
dc.date.available2022-07-16T17:08:06Z-
dc.date.created2021-05-12-
dc.date.issued2012-01-
dc.identifier.issn0013-4651-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/166545-
dc.description.abstractAs for chemical mechanical polishing (CMP) of polycrystalline Ge2Sb2Te5 (pc-GST), the corrosion-inhibition efficiency and polishing rate of 1-vinyl-2-pyrrolidinone (VP) and polyvinyl pyrrolidone (PVP) with molecular weights of 3.5 k, 25 k, and 1300 k g/mol were estimated. The estimation results show that there is an optimal molecule weight of the corrosion inhibitor (i.e., 3.5 k g/mol) to achieve free of corrosion pits and the lowest surface roughness after polishing test. These results demonstrate that the formation of a uniform polymeric passivation layer arising from a corrosion inhibitor can prevent a direct penetration of the oxidizer H2O2 at the optimum molecule weight of the corrosion inhibitor during the pc-GST CMP.-
dc.language영어-
dc.language.isoen-
dc.publisherELECTROCHEMICAL SOC INC-
dc.titleEffect of Molecular Weight of Polyvinylpyrrolidone on Corrosion-Inhibition Efficiency of Polycrystalline Ge2Sb2Te5 Film-
dc.typeArticle-
dc.contributor.affiliatedAuthorPark, Jea-Gun-
dc.identifier.doi10.1149/2.032204jes-
dc.identifier.scopusid2-s2.0-84863156125-
dc.identifier.wosid000300488300092-
dc.identifier.bibliographicCitationJOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.159, no.4, pp.H412 - H416-
dc.relation.isPartOfJOURNAL OF THE ELECTROCHEMICAL SOCIETY-
dc.citation.titleJOURNAL OF THE ELECTROCHEMICAL SOCIETY-
dc.citation.volume159-
dc.citation.number4-
dc.citation.startPageH412-
dc.citation.endPageH416-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaElectrochemistry-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalWebOfScienceCategoryElectrochemistry-
dc.relation.journalWebOfScienceCategoryMaterials Science, Coatings & Films-
dc.subject.keywordPlusChemical mechanical polishing-
dc.subject.keywordPlusGermanium-
dc.subject.keywordPlusMolecular weight-
dc.subject.keywordPlusPolishing-
dc.subject.keywordPlusSurface roughness-
dc.identifier.urlhttps://iopscience.iop.org/article/10.1149/2.032204jes-
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