Effect of Molecular Weight of Polyvinylpyrrolidone on Corrosion-Inhibition Efficiency of Polycrystalline Ge2Sb2Te5 Film
DC Field | Value | Language |
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dc.contributor.author | Cho, Jong-Young | - |
dc.contributor.author | Yi, Sok-Ho | - |
dc.contributor.author | Park, Jin-Hyung | - |
dc.contributor.author | Park, Jea-Gun | - |
dc.date.accessioned | 2022-07-16T17:08:06Z | - |
dc.date.available | 2022-07-16T17:08:06Z | - |
dc.date.created | 2021-05-12 | - |
dc.date.issued | 2012-01 | - |
dc.identifier.issn | 0013-4651 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/166545 | - |
dc.description.abstract | As for chemical mechanical polishing (CMP) of polycrystalline Ge2Sb2Te5 (pc-GST), the corrosion-inhibition efficiency and polishing rate of 1-vinyl-2-pyrrolidinone (VP) and polyvinyl pyrrolidone (PVP) with molecular weights of 3.5 k, 25 k, and 1300 k g/mol were estimated. The estimation results show that there is an optimal molecule weight of the corrosion inhibitor (i.e., 3.5 k g/mol) to achieve free of corrosion pits and the lowest surface roughness after polishing test. These results demonstrate that the formation of a uniform polymeric passivation layer arising from a corrosion inhibitor can prevent a direct penetration of the oxidizer H2O2 at the optimum molecule weight of the corrosion inhibitor during the pc-GST CMP. | - |
dc.language | 영어 | - |
dc.language.iso | en | - |
dc.publisher | ELECTROCHEMICAL SOC INC | - |
dc.title | Effect of Molecular Weight of Polyvinylpyrrolidone on Corrosion-Inhibition Efficiency of Polycrystalline Ge2Sb2Te5 Film | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Park, Jea-Gun | - |
dc.identifier.doi | 10.1149/2.032204jes | - |
dc.identifier.scopusid | 2-s2.0-84863156125 | - |
dc.identifier.wosid | 000300488300092 | - |
dc.identifier.bibliographicCitation | JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.159, no.4, pp.H412 - H416 | - |
dc.relation.isPartOf | JOURNAL OF THE ELECTROCHEMICAL SOCIETY | - |
dc.citation.title | JOURNAL OF THE ELECTROCHEMICAL SOCIETY | - |
dc.citation.volume | 159 | - |
dc.citation.number | 4 | - |
dc.citation.startPage | H412 | - |
dc.citation.endPage | H416 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.isOpenAccess | N | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Electrochemistry | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalWebOfScienceCategory | Electrochemistry | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Coatings & Films | - |
dc.subject.keywordPlus | Chemical mechanical polishing | - |
dc.subject.keywordPlus | Germanium | - |
dc.subject.keywordPlus | Molecular weight | - |
dc.subject.keywordPlus | Polishing | - |
dc.subject.keywordPlus | Surface roughness | - |
dc.identifier.url | https://iopscience.iop.org/article/10.1149/2.032204jes | - |
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