Site-Specific Design of Cone-Shaped Si Nanowires by Exploiting Nanoscale Surface Diffusion for Optimal Photoabsorption
- Authors
- Yi, Jaeseok; Lee, Dong Hyun; Park, Won Il
- Issue Date
- Sep-2011
- Publisher
- AMER CHEMICAL SOC
- Keywords
- Si nanowires; nanocones; site-specific control; antireflection effect; nanoscale diffusion
- Citation
- CHEMISTRY OF MATERIALS, v.23, no.17, pp.3902 - 3906
- Indexed
- SCIE
SCOPUS
- Journal Title
- CHEMISTRY OF MATERIALS
- Volume
- 23
- Number
- 17
- Start Page
- 3902
- End Page
- 3906
- URI
- https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/167697
- DOI
- 10.1021/cm201188z
- ISSN
- 0897-4756
- Abstract
- In this study, we introduce a new strategy to control silicon nanowire (SiNW) morphology (cone shape and cylindrical shape) by exploiting adatom diffusion at the nanostructured surface. In our approach, by using chemical treatment with a mixture of HF and H2SO4 acids, ordinary flat Si substrates were changed to nanoscale-faceted, corrugated surfaces, accompanied by a transition from a hydrophobic to hydrophilic surface. These nanostructured surfaces enhanced the surface diffusion, which eventually stimulated radial growth to change the NW morphology from a cylindrical shape to a cone shape with a sharp tip. By using site-specific chemical treatment, both cone-shaped and cylindrical-shaped SiNWs could be achieved selectively on the same chip under the same conditions. Furthermore, these shape-controlled SiNWs demonstrated an outstanding antireflection effect over a broad range of wavelengths, as determined by optical measurements and finite-difference time-domain modeling.
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