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Growth of Si-doped GaInP on Ge-on-Si substrates and its photoluminescence characteristics

Authors
Yang, ChangjaeLee, SangsooShin, Keun WookOh, SewoungPark, JinsubKim, Chang-ZooPark, Won-KyuHa, Seung-KyuChoi, Won JunYoon, Euijoon
Issue Date
Aug-2011
Publisher
American Institute of Physics
Citation
Applied Physics Letters, v.99, no.9, pp 1 - 3
Pages
3
Indexed
SCI
SCIE
SCOPUS
Journal Title
Applied Physics Letters
Volume
99
Number
9
Start Page
1
End Page
3
URI
https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/167905
DOI
10.1063/1.3623757
ISSN
0003-6951
1077-3118
Abstract
Optical properties of Si-doped GaInP grown on Ge-on-Si substrates were investigated using photoluminescence (PL). Similar to spontaneously ordered GaInP, two peaks were observed around 1.74 and 1.85 eV at 19 K; however, no satellite peaks were observed in the selected-area diffraction pattern. Based on temperature-dependent PL, the peak at 1.74 eV was attributed to the donor-acceptor pair transition caused by the amphoteric characteristics of Si and/or Ge from the dopant and/or substrate. In addition, the S-shape in the temperature dependence of the 1.85 eV peak was attributed to the interaction of the donor levels with the conduction band of GaInP.
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