Carbon contamination of EUV mask and its effect on CD performance
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Lee, Sangsul | - |
dc.contributor.author | Doh, Jong Gul | - |
dc.contributor.author | Lee, Jae Uk | - |
dc.contributor.author | Lee, Inhwan | - |
dc.contributor.author | Jeong, Chang Young | - |
dc.contributor.author | Lee, Dong Gun | - |
dc.contributor.author | Rah, Seung-yu | - |
dc.contributor.author | Ahn, Jinho | - |
dc.date.accessioned | 2022-07-16T19:59:14Z | - |
dc.date.available | 2022-07-16T19:59:14Z | - |
dc.date.created | 2021-05-12 | - |
dc.date.issued | 2011-07 | - |
dc.identifier.issn | 1567-1739 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/168086 | - |
dc.description.abstract | The carbon contamination on extreme ultraviolet (EUV) masks is a critical issue causing throughput degradation and unexpected effects on imaging performance. In this work, a series of carbon contamination experiments were performed on a patterned EUV mask. The impact of carbon contamination on imaging performance was analyzed using actinic EUV coherent scattering microscopy (CSM) combined with an in-situ accelerated contamination system (ICS), which was installed on 11B EUVL beam-line at Pohang Light Source (PLS). In addition, the topography of the carbon contamination on the patterned mask was inspected with a scanning electron microscope (SEM). The mask critical dimension (CD) and reflectivity were compared before and after carbon contamination through accelerated exposure. The reflectivity degradation was measured as 5.5% after 3 h exposure which caused similar to 20 nm carbon deposition. A mask CD change of 88 nm line and the space pattern showed a similar trend but different absolute values as measured by CSM and CD-SEM. This difference confirms the importance of actinic inspection technique which emulates the practical imaging condition (6 degrees incident angle) as an EUV exposure tool. | - |
dc.language | 영어 | - |
dc.language.iso | en | - |
dc.publisher | ELSEVIER | - |
dc.title | Carbon contamination of EUV mask and its effect on CD performance | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Ahn, Jinho | - |
dc.identifier.doi | 10.1016/j.cap.2011.07.019 | - |
dc.identifier.scopusid | 2-s2.0-80455164672 | - |
dc.identifier.wosid | 000296726300027 | - |
dc.identifier.bibliographicCitation | CURRENT APPLIED PHYSICS, v.11, no.4, pp.S107 - S110 | - |
dc.relation.isPartOf | CURRENT APPLIED PHYSICS | - |
dc.citation.title | CURRENT APPLIED PHYSICS | - |
dc.citation.volume | 11 | - |
dc.citation.number | 4 | - |
dc.citation.startPage | S107 | - |
dc.citation.endPage | S110 | - |
dc.type.rims | ART | - |
dc.type.docType | Article; Proceedings Paper | - |
dc.description.journalClass | 1 | - |
dc.description.isOpenAccess | N | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.subject.keywordPlus | LAYER | - |
dc.subject.keywordAuthor | EUVL | - |
dc.subject.keywordAuthor | Coherent scattering microscopy | - |
dc.subject.keywordAuthor | Carbon contamination | - |
dc.subject.keywordAuthor | Mask CD | - |
dc.subject.keywordAuthor | Reflectivity | - |
dc.subject.keywordAuthor | Shadowing effect | - |
dc.identifier.url | https://www.sciencedirect.com/science/article/pii/S1567173911003907?via%3Dihub | - |
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