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Atomic arrangement variations of [0001]-tilt grain boundaries in ZnO thin films grown on p-Si substrates due to thermal treatment

Authors
Shin, Jae-wonLee, JeongyongNo, Young-sooJung, Jae-hunKim, Tae WhanChoi, WK
Issue Date
Apr-2007
Publisher
AMER INST PHYSICS
Citation
APPLIED PHYSICS LETTERS, v.90, no.18, pp.1 - 4
Indexed
SCIE
SCOPUS
Journal Title
APPLIED PHYSICS LETTERS
Volume
90
Number
18
Start Page
1
End Page
4
URI
https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/172325
DOI
10.1063/1.2732177
ISSN
0003-6951
Abstract
The plane-view high-resolution transmission electron microscopy (HRTEM) images in ZnO thin films grown on p-Si substrates showed that (10 $(1) over bar $0) asymmetric grain boundaries with a periodic array of strain contrast features existed in a sparse columnar structure for as- grown ZnO thin films and that (11 $(2) over bar $0) asymmetric grain boundaries and (851 $(3) over bar $0) symmetric grain boundaries existed in a dense columnar structure for annealed ZnO thin films. The atomic arrangement variations of [0001]- tilt grain boundaries in ZnO thin films grown on Si substrates due to thermal treatment are described on the basis of the HRTEM results.
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