Titanium Oxide Thin Films Prepared by Plasma Enhanced Atomic Layer Deposition Using Remote Electron Cyclotron Resonance Plasma for Organic Devices Passivation
- Authors
- Kang, Byung-Woo; Kim, Woong-Sun; Hwang, Chang-Mook; Moon, Dae-Yong; Kim, Jay-Jung; Park, Jae-Gun; Park, Jong-Wan
- Issue Date
- Aug-2010
- Publisher
- IOP PUBLISHING LTD
- Citation
- JAPANESE JOURNAL OF APPLIED PHYSICS, v.49, no.8, pp.1 - 3
- Indexed
- SCIE
SCOPUS
- Journal Title
- JAPANESE JOURNAL OF APPLIED PHYSICS
- Volume
- 49
- Number
- 8
- Start Page
- 1
- End Page
- 3
- URI
- https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/174361
- DOI
- 10.1143/JJAP.49.08JG05
- ISSN
- 0021-4922
- Abstract
- We examined titanium oxide films and their barrier characteristics Titanium oxide films were deposited at room temperature with electron cyclotron resonance plasma power of 300 W We measured the growth rate of the titanium oxide film to be 1 8 angstrom/cycle Barrier layers on poly(ether sulfon) (PES) substrates were observed to provide activation energy for water permeation Activation energy of 124 kJ/mol was added by applying a titanium oxide coating with a thickness of 100 nm The passivation performance of the titanium oxide film was also investigated using organic light-emitting diodes (OLEDs) The relative luminance of a 400-nm-thick-coated OLED device was diminished by 11 6% for 20 h
- Files in This Item
-
Go to Link
- Appears in
Collections - 서울 공과대학 > 서울 기계공학부 > 1. Journal Articles
![qrcode](https://api.qrserver.com/v1/create-qr-code/?size=55x55&data=https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/174361)
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.