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Titanium Oxide Thin Films Prepared by Plasma Enhanced Atomic Layer Deposition Using Remote Electron Cyclotron Resonance Plasma for Organic Devices Passivation
- Authors
- Kang, Byung-Woo; Kim, Woong-Sun; Hwang, Chang-Mook; Moon, Dae-Yong; Kim, Jay-Jung; Park, Jae-Gun; Park, Jong-Wan
- Issue Date
- Aug-2010
- Publisher
- IOP Publishing Ltd
- Citation
- Japanese Journal of Applied Physics, v.49, no.8, pp 1 - 3
- Pages
- 3
- Indexed
- SCI
SCIE
SCOPUS
- Journal Title
- Japanese Journal of Applied Physics
- Volume
- 49
- Number
- 8
- Start Page
- 1
- End Page
- 3
- ISSN
- 0021-4922
1347-4065
- Abstract
- We examined titanium oxide films and their barrier characteristics Titanium oxide films were deposited at room temperature with electron cyclotron resonance plasma power of 300 W We measured the growth rate of the titanium oxide film to be 1 8 angstrom/cycle Barrier layers on poly(ether sulfon) (PES) substrates were observed to provide activation energy for water permeation Activation energy of 124 kJ/mol was added by applying a titanium oxide coating with a thickness of 100 nm The passivation performance of the titanium oxide film was also investigated using organic light-emitting diodes (OLEDs) The relative luminance of a 400-nm-thick-coated OLED device was diminished by 11 6% for 20 h
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