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Formation mechanisms of metallic Zn nanodots by using ZnO thin films deposited on n-Si substrates
- Authors
- Yuk, J. M.; Lee, J. Y.; Kim, Y.; No, Y. S.; Kim, T. W.; Choi, W. K.
- Issue Date
- Aug-2010
- Publisher
- American Institute of Physics
- Keywords
- atomic force microscopy; diffusion; grain boundaries; nanofabrication; nanostructured materials; sputter etching; transmission electron microscopy; X-ray chemical analysis; zinc
- Citation
- Applied Physics Letters, v.97, no.6
- Indexed
- SCI
SCIE
SCOPUS
- Journal Title
- Applied Physics Letters
- Volume
- 97
- Number
- 6
- ISSN
- 0003-6951
1077-3118
- Abstract
- High-resolution transmission electron microscopy and energy dispersive x-ray spectroscopy results showed that metallic Zn nanodots (NDs) were fabricated through transformation of ZnO thin films by deposition of SiO(x) on ZnO/n-Si (100) heterostructures. The Zn NDs with various sizes and densities were formed due to the occurrence of the mass diffusion of atoms along the grain boundaries in the ZnO thin films. The fabrication mechanisms of metallic Zn NDs through transformation of ZnO thin films deposited on n-Si substrates are described on the basis of the experimental results.
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