Cited 0 time in
Impedance transition and series resonance between bulk plasma and sheath in biased inductively coupled plasma
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Lee, Hyo-Chang | - |
| dc.contributor.author | Chung, Chin-Wook | - |
| dc.date.accessioned | 2022-12-20T16:29:30Z | - |
| dc.date.available | 2022-12-20T16:29:30Z | - |
| dc.date.issued | 2010-07 | - |
| dc.identifier.issn | 0040-6090 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/174464 | - |
| dc.description.abstract | The impedance transition and electron series resonance at an RF bias substrate were observed in 13.56 MHz inductively coupled plasma (ICP). As ICP coil power increased, the impedance of the RF bias transitioned from a capacitive to an inductive load. When bias voltages and discharge impedances reached minimums, bias voltages and currents were in-phase during the transition. The transition can be understood as a series LC resonance between the sheaths (capacitor) and plasma bulks (inductance due to electron inertia). This corresponds to the electron series resonance (ESR) observed in very high-frequency capacitive discharges, and a new ESR frequency which considers sheath resistances is presented. | - |
| dc.format.extent | 4 | - |
| dc.language | 영어 | - |
| dc.language.iso | ENG | - |
| dc.publisher | Elsevier Sequoia | - |
| dc.title | Impedance transition and series resonance between bulk plasma and sheath in biased inductively coupled plasma | - |
| dc.type | Article | - |
| dc.publisher.location | 스위스 | - |
| dc.identifier.doi | 10.1016/j.tsf.2010.03.147 | - |
| dc.identifier.scopusid | 2-s2.0-77955781244 | - |
| dc.identifier.wosid | 000279659900032 | - |
| dc.identifier.bibliographicCitation | Thin Solid Films, v.518, no.18, pp 5219 - 5222 | - |
| dc.citation.title | Thin Solid Films | - |
| dc.citation.volume | 518 | - |
| dc.citation.number | 18 | - |
| dc.citation.startPage | 5219 | - |
| dc.citation.endPage | 5222 | - |
| dc.type.docType | Article | - |
| dc.description.isOpenAccess | N | - |
| dc.description.journalRegisteredClass | sci | - |
| dc.description.journalRegisteredClass | scie | - |
| dc.description.journalRegisteredClass | scopus | - |
| dc.relation.journalResearchArea | Materials Science | - |
| dc.relation.journalResearchArea | Physics | - |
| dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
| dc.relation.journalWebOfScienceCategory | Materials Science, Coatings & Films | - |
| dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
| dc.relation.journalWebOfScienceCategory | Physics, Condensed Matter | - |
| dc.subject.keywordPlus | RADIOFREQUENCY | - |
| dc.subject.keywordPlus | DISCHARGES | - |
| dc.subject.keywordAuthor | Inductively coupled plasma | - |
| dc.subject.keywordAuthor | Biased inductively coupled plasma | - |
| dc.subject.keywordAuthor | RE bias power Impedance transition | - |
| dc.subject.keywordAuthor | Electron series resonance | - |
| dc.identifier.url | https://www.sciencedirect.com/science/article/pii/S0040609010004761?via%3Dihub | - |
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
222, Wangsimni-ro, Seongdong-gu, Seoul, 04763, Korea+82-2-2220-1366
COPYRIGHT © 2024 HANYANG UNIVERSITY.
Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.
You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.
