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Universal Relationship between PECVD SiO2 Gate Insulator Film Properties and a-ITZO TFT Characteristics
- Authors
- 오새룬터
- Issue Date
- 20220125
- Place
- 강원도 하이원 그랜드호텔
- Conference Name
- 제29회 한국반도체학술대회
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Related Researcher
- OH, SAE ROON TER
- ERICA 공학대학 (SCHOOL OF ELECTRICAL ENGINEERING)