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Zero-internal fields in nonpolar InGaN/GaN multi-quantum wells grown by the multi-buffer layer technique

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dc.contributor.authorSong, Hooyoung-
dc.contributor.authorKim, Jin Soak-
dc.contributor.authorKim, Eun Kyu-
dc.contributor.authorSeo, Yong Gon-
dc.contributor.authorHwang, Sung-Min-
dc.date.accessioned2022-12-20T18:18:40Z-
dc.date.available2022-12-20T18:18:40Z-
dc.date.created2022-08-27-
dc.date.issued2010-04-
dc.identifier.issn0957-4484-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/175197-
dc.description.abstractThe potential of nonpolar a-plane InGaN/GaN multi-quantum wells (MQWs), which are free from a strong piezoelectric field, was demonstrated. An a-GaN template grown on an r-plane sapphire substrate by the multi-buffer layer technique showed high structural quality with an omega full width at half maximum value along the c-axis of 418 arcsec obtained from high-resolution x-ray diffraction analysis. From barrier analysis by deep level transient spectroscopy, it appeared that a-plane InGaN/GaN MQWs can solve the efficiency droop problem as they have a lower electron capture barrier than the c-plane sample. The peak shift of the temperature-dependent photoluminescence signal for the nonpolar InGaN/GaN MQWs was well fitted by Varshni's empirical equation with zero-internal fields. A high photoluminescence efficiency of 0.27 from this sample also showed that nonpolar MQWs can be the key factor to solve the efficiency limitation in conventional c-plane GaN based light emitting diodes.-
dc.language영어-
dc.language.isoen-
dc.publisherIOP PUBLISHING LTD-
dc.titleZero-internal fields in nonpolar InGaN/GaN multi-quantum wells grown by the multi-buffer layer technique-
dc.typeArticle-
dc.contributor.affiliatedAuthorKim, Eun Kyu-
dc.identifier.doi10.1088/0957-4484/21/13/134026-
dc.identifier.scopusid2-s2.0-77949343561-
dc.identifier.wosid000275242200027-
dc.identifier.bibliographicCitationNANOTECHNOLOGY, v.21, no.13, pp.1 - 6-
dc.relation.isPartOfNANOTECHNOLOGY-
dc.citation.titleNANOTECHNOLOGY-
dc.citation.volume21-
dc.citation.number13-
dc.citation.startPage1-
dc.citation.endPage6-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaScience & Technology - Other Topics-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryNanoscience & Nanotechnology-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.subject.keywordPlusLEVEL TRANSIENT SPECTROSCOPY-
dc.subject.keywordPlusQUANTUM-WELLS-
dc.subject.keywordPlusEMISSION-
dc.subject.keywordPlusSEMICONDUCTORS-
dc.subject.keywordPlusNITRIDE-
dc.subject.keywordPlusDIODES-
dc.subject.keywordPlusFILMS-
dc.identifier.urlhttps://iopscience.iop.org/article/10.1088/0957-4484/21/13/134026-
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