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Atomic Arrangements of Asymmetrically-tilted Grain Boundaries in 30 degrees Rotation Domains of ZnO Thin Films Grown on n-Si Substrates

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dc.contributor.authorYuk, Jong Min-
dc.contributor.authorNo, Young Soo-
dc.contributor.authorKim, Tae Whan-
dc.contributor.authorKim, Jin-young-
dc.contributor.authorChoi, Won Kook-
dc.date.accessioned2022-12-20T21:39:03Z-
dc.date.available2022-12-20T21:39:03Z-
dc.date.created2022-08-26-
dc.date.issued2009-07-
dc.identifier.issn0374-4884-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/176537-
dc.description.abstractSelected-area electron diffraction patterns for ZnO/Si heterostructures annealed at 800 degrees C showed that 30 degrees rotation domains were generated in the ZnO thin films. The plane-view high-resolution transmission electron microscopy (HRTEM) images for the ZnO thin films grown on n-Si substrates annealed at 800 degrees C showed that asymmetrical tilt grain boundaries were tilted by 16.5 degrees and 13.5 degrees from two grains with a 30 degrees tilted angle. The grain boundary planes of the two grains were (35 (8) over bar0) and (23 (5) over bar0). The atomic arrangements of the asymmetrically-tilted grain boundaries in 30 degrees rotation domains of ZnO thin films grown on n-Si substrates annealed at 800 degrees C are described on the basis of the HRTEM results.-
dc.language영어-
dc.language.isoen-
dc.publisherKOREAN PHYSICAL SOC-
dc.titleAtomic Arrangements of Asymmetrically-tilted Grain Boundaries in 30 degrees Rotation Domains of ZnO Thin Films Grown on n-Si Substrates-
dc.typeArticle-
dc.contributor.affiliatedAuthorKim, Tae Whan-
dc.identifier.doi10.3938/jkps.55.246-
dc.identifier.scopusid2-s2.0-69249161979-
dc.identifier.wosid000268023600054-
dc.identifier.bibliographicCitationJOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.55, no.1, pp.246 - 249-
dc.relation.isPartOfJOURNAL OF THE KOREAN PHYSICAL SOCIETY-
dc.citation.titleJOURNAL OF THE KOREAN PHYSICAL SOCIETY-
dc.citation.volume55-
dc.citation.number1-
dc.citation.startPage246-
dc.citation.endPage249-
dc.type.rimsART-
dc.type.docTypeArticle; Proceedings Paper-
dc.identifier.kciidART001498242-
dc.description.journalClass1-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.description.journalRegisteredClasskci-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryPhysics, Multidisciplinary-
dc.subject.keywordPlusOPTICAL-PROPERTIES-
dc.subject.keywordPlusEPITAXIAL-FILMS-
dc.subject.keywordPlusBUFFER LAYER-
dc.subject.keywordPlusTEMPERATURE-
dc.subject.keywordPlusDEPENDENCE-
dc.subject.keywordPlusEMISSION-
dc.subject.keywordPlusEDGE-
dc.subject.keywordAuthorZnO thin film-
dc.subject.keywordAuthorSi substrate-
dc.subject.keywordAuthorRotation domain-
dc.subject.keywordAuthorGrain boundary-
dc.subject.keywordAuthorAtomic arrangement-
dc.identifier.urlhttps://www.jkps.or.kr/journal/view.html?volume=55&number=1&spage=246&year=2009-
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