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Atomic arrangement variations of 30 degrees in-plane rotation domain boundaries in ZnO thin films grown on Si substrates due to thermal annealing
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Shin, Jin Wook | - |
| dc.contributor.author | Lee, Jeong Yong | - |
| dc.contributor.author | No, Young Soo | - |
| dc.contributor.author | Kim, Tae Whan | - |
| dc.contributor.author | Choi, Won Kook | - |
| dc.date.accessioned | 2022-12-20T21:55:48Z | - |
| dc.date.available | 2022-12-20T21:55:48Z | - |
| dc.date.issued | 2009-06 | - |
| dc.identifier.issn | 0884-2914 | - |
| dc.identifier.issn | 2044-5326 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/176689 | - |
| dc.description.abstract | High-resolution transmission electron microscopy (HRTEM) images of annealed ZnO thin-films showed the domain boundaries of a (01 (1) over bar0) plane with a transition zone and a (01 (1) over bar1) plane without a transition zone. The 30 degrees in-plane rotation domain boundaries were formed in the ZnO thin films because the angle of the c-axis was tilted 3.5 degrees in comparison with that of neighboring 30 degrees in-plane rotation domains to reduce the misfit strain energy. The atomic arrangement variations of 30 degrees in-plane rotation domain boundaries in ZnO thin films grown on Si substrates due to thermal annealing are described. | - |
| dc.format.extent | 5 | - |
| dc.language | 영어 | - |
| dc.language.iso | ENG | - |
| dc.publisher | Materials Research Society | - |
| dc.title | Atomic arrangement variations of 30 degrees in-plane rotation domain boundaries in ZnO thin films grown on Si substrates due to thermal annealing | - |
| dc.type | Article | - |
| dc.publisher.location | 미국 | - |
| dc.identifier.doi | 10.1557/JMR.2009.0233 | - |
| dc.identifier.scopusid | 2-s2.0-68149126734 | - |
| dc.identifier.wosid | 000267207900015 | - |
| dc.identifier.bibliographicCitation | Journal of Materials Research, v.24, no.6, pp 2006 - 2010 | - |
| dc.citation.title | Journal of Materials Research | - |
| dc.citation.volume | 24 | - |
| dc.citation.number | 6 | - |
| dc.citation.startPage | 2006 | - |
| dc.citation.endPage | 2010 | - |
| dc.type.docType | Article | - |
| dc.description.isOpenAccess | N | - |
| dc.description.journalRegisteredClass | scie | - |
| dc.description.journalRegisteredClass | scopus | - |
| dc.relation.journalResearchArea | Materials Science | - |
| dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
| dc.subject.keywordPlus | ELECTRONIC-STRUCTURE | - |
| dc.subject.keywordPlus | SAPPHIRE | - |
| dc.subject.keywordPlus | EPITAXY | - |
| dc.identifier.url | https://link.springer.com/article/10.1557/jmr.2009.0233 | - |
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