Fabrication of two-dimensional magnetic arrays using CMOS process
- Authors
- Nam, Won Chang; Kim, Jin Bae; Seo, Min Su; Eom, Tae Woon; Lee, Seong Jae; Lee, Young Pak
- Issue Date
- Mar-2009
- Publisher
- ELSEVIER
- Keywords
- Magnetic arrays; Fabrication; CMOS process; Lithography; Wet-etching; Co
- Citation
- CURRENT APPLIED PHYSICS, v.9, no.2, pp.E193 - E196
- Indexed
- SCIE
SCOPUS
KCI
- Journal Title
- CURRENT APPLIED PHYSICS
- Volume
- 9
- Number
- 2
- Start Page
- E193
- End Page
- E196
- URI
- https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/177175
- DOI
- 10.1016/j.cap.2008.12.059
- ISSN
- 1567-1739
- Abstract
- We fabricated two-dimensional (2-D) Co magnetic arrays starting from a 40-nm-thick Co layer on a 6-in. Si wafer by photolithography with a KrF laser source and the wet-etching process. Various patterns, including square and triangular lattices, were achieved, with their smallest feature size ranging from 300 to 800 nm. In this paper, we present the key processes to prepare nano-scaled 2-D magnetic arrays and the fabricated structures, along with their magnetic properties.
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