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Thermal decomposition of perfluorodecylsiloxane self-assembled monolayers in air
- Authors
- Seo, Eun K.; Sung, Myung Mo
- Issue Date
- Oct-2007
- Publisher
- ELSEVIER SCIENCE BV
- Keywords
- perfluorodecylsiloxane; monolayer
- Citation
- ULTRAMICROSCOPY, v.107, no.10-11, pp.995 - 999
- Indexed
- SCIE
SCOPUS
- Journal Title
- ULTRAMICROSCOPY
- Volume
- 107
- Number
- 10-11
- Start Page
- 995
- End Page
- 999
- ISSN
- 0304-3991
- Abstract
- The thermal decomposition of perfluorodecylsiloxane self-assembled monolayers (SAMs) in air has been studied using atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS), and contact angle analysis. It is found that the monolayers are stable in air up to about 300 degrees C. Above 350 degrees C the monolayers primarily decompose through C-C bond cleavage, with a gradual reduction in chain length.
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Related Researcher
- Sung, Myung Mo
- COLLEGE OF NATURAL SCIENCES (DEPARTMENT OF CHEMISTRY)