Atomic arrangement and formation mechanism of c-axis oriented ZnO thin films grown on p-Si substrates
- Authors
- Park, Namkyoo; Lee, Hoseong; No, Young soo; Kim, Tae Whan; Lee, Jeongyong; Choi, WK
- Issue Date
- Sep-2007
- Publisher
- Scitec Publications Ltd.
- Keywords
- Atomic arrangement; Formation mechanism; Si substrate; Structural property; ZnO film
- Citation
- Solid State Phenomena, v.124-126, no.PART 1, pp 93 - 96
- Pages
- 4
- Indexed
- SCOPUS
- Journal Title
- Solid State Phenomena
- Volume
- 124-126
- Number
- PART 1
- Start Page
- 93
- End Page
- 96
- URI
- https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/179575
- DOI
- 10.4028/www.scientific.net/SSP.124-126.93
- ISSN
- 1012-0394
1662-9779
- Abstract
- The X-ray diffraction (XRD) pattern for the ZnO films grown on Si (100) substrates indicates that the grown ZnO films have a strong c-axis orientation. The pole figure indicates that ZnO thin films have columnars with the grains of the [0002] crystallographic axis perpendicular to the Si (100) substrate, indicative of the random rotational orientations along the c-axis. Selected area electron diffraction pattern (SADP) of the ZnO/Si (100) heterostructures shows that the ZnO preferential oriented film is formed on the Si substrate. A possible atomic arrangement of the crystal structure and the formation mechanism of the c-axis orientated ZnO thin films grown on p-Si substrates are discussed on the basis of the XRD, the pole figure, and SADP results.
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