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Atomic arrangement and formation mechanism of c-axis oriented ZnO thin films grown on p-Si substrates

Authors
Park, NamkyooLee, HoseongNo, Young sooKim, Tae WhanLee, JeongyongChoi, WK
Issue Date
Sep-2007
Publisher
Scitec Publications Ltd.
Keywords
Atomic arrangement; Formation mechanism; Si substrate; Structural property; ZnO film
Citation
Solid State Phenomena, v.124-126, no.PART 1, pp 93 - 96
Pages
4
Indexed
SCOPUS
Journal Title
Solid State Phenomena
Volume
124-126
Number
PART 1
Start Page
93
End Page
96
URI
https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/179575
DOI
10.4028/www.scientific.net/SSP.124-126.93
ISSN
1012-0394
1662-9779
Abstract
The X-ray diffraction (XRD) pattern for the ZnO films grown on Si (100) substrates indicates that the grown ZnO films have a strong c-axis orientation. The pole figure indicates that ZnO thin films have columnars with the grains of the [0002] crystallographic axis perpendicular to the Si (100) substrate, indicative of the random rotational orientations along the c-axis. Selected area electron diffraction pattern (SADP) of the ZnO/Si (100) heterostructures shows that the ZnO preferential oriented film is formed on the Si substrate. A possible atomic arrangement of the crystal structure and the formation mechanism of the c-axis orientated ZnO thin films grown on p-Si substrates are discussed on the basis of the XRD, the pole figure, and SADP results.
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