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Design of mask grating for obtaining the effect of an offaxis illumination in optical lithography
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Kim, Young-Seok | - |
| dc.contributor.author | Song, Seok Ho | - |
| dc.contributor.author | Oh, Sung-Hyun | - |
| dc.contributor.author | Choi, Yong-Kyu | - |
| dc.contributor.author | Beom-Hoan O. | - |
| dc.contributor.author | Park, Se-Geun | - |
| dc.contributor.author | Lee, El-Hang | - |
| dc.contributor.author | Lee, Seung Gol | - |
| dc.date.accessioned | 2022-12-21T06:53:17Z | - |
| dc.date.available | 2022-12-21T06:53:17Z | - |
| dc.date.created | 2022-09-16 | - |
| dc.date.issued | 2007-08 | - |
| dc.identifier.issn | 2162-2701 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/179733 | - |
| dc.description.abstract | We proposed the new method for obtaining the effect of an off-axis illumination by using a mask grating formed on the photo mask. The grating structure was designed from the source distribution in the conventional off-axis illumination and the rigorous diffraction theory. Its performance was characterized with simulated Bossung curve. | - |
| dc.language | 영어 | - |
| dc.language.iso | en | - |
| dc.publisher | Optical Society of America | - |
| dc.title | Design of mask grating for obtaining the effect of an offaxis illumination in optical lithography | - |
| dc.type | Article | - |
| dc.contributor.affiliatedAuthor | Song, Seok Ho | - |
| dc.identifier.scopusid | 2-s2.0-84899053547 | - |
| dc.identifier.bibliographicCitation | Optics InfoBase Conference Papers, pp.1 - 2 | - |
| dc.relation.isPartOf | Optics InfoBase Conference Papers | - |
| dc.citation.title | Optics InfoBase Conference Papers | - |
| dc.citation.startPage | 1 | - |
| dc.citation.endPage | 2 | - |
| dc.type.rims | ART | - |
| dc.type.docType | Conference Paper | - |
| dc.description.journalClass | 1 | - |
| dc.description.isOpenAccess | N | - |
| dc.description.journalRegisteredClass | scopus | - |
| dc.subject.keywordPlus | Photolithography | - |
| dc.subject.keywordPlus | Grating structures | - |
| dc.subject.keywordPlus | Off-axis illumination | - |
| dc.subject.keywordPlus | Rigorous diffraction theory | - |
| dc.subject.keywordPlus | Source distribution | - |
| dc.subject.keywordPlus | Diffraction gratings | - |
| dc.identifier.url | https://opg.optica.org/abstract.cfm?uri=CLEOPR-2007-ThP_042 | - |
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- Song, Seok Ho
- COLLEGE OF NATURAL SCIENCES (DEPARTMENT OF PHYSICS)