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Design of mask grating for obtaining the effect of an offaxis illumination in optical lithography
- Authors
- Kim, Young-Seok; Song, Seok Ho; Oh, Sung-Hyun; Choi, Yong-Kyu; Beom-Hoan O.; Park, Se-Geun; Lee, El-Hang; Lee, Seung Gol
- Issue Date
- Aug-2007
- Publisher
- Optical Society of America
- Citation
- Optics InfoBase Conference Papers, pp.1 - 2
- Indexed
- SCOPUS
- Journal Title
- Optics InfoBase Conference Papers
- Start Page
- 1
- End Page
- 2
- ISSN
- 2162-2701
- Abstract
- We proposed the new method for obtaining the effect of an off-axis illumination by using a mask grating formed on the photo mask. The grating structure was designed from the source distribution in the conventional off-axis illumination and the rigorous diffraction theory. Its performance was characterized with simulated Bossung curve.
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Related Researcher
- Song, Seok Ho
- COLLEGE OF NATURAL SCIENCES (DEPARTMENT OF PHYSICS)