Nanoscale patterning using photo-assisted polymer transfer lithography
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Park, In Sung | - |
dc.contributor.author | Jang, Moonik | - |
dc.contributor.author | Ahn, Jinho | - |
dc.date.accessioned | 2022-12-21T08:25:14Z | - |
dc.date.available | 2022-12-21T08:25:14Z | - |
dc.date.created | 2022-08-26 | - |
dc.date.issued | 2007-05 | - |
dc.identifier.issn | 0167-9317 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/180158 | - |
dc.description.abstract | We successfully demonstrate photo-assisted polymer transfer lithography for submicron-size patterning to greatly simplify conventional decal transfer lithography. For a small size patterning, this process includes three main processes: fabrication of a precise poly-dimethylsiloxaene (PDMS) stamp, TiO2 film deposition on substrate and subsequent annealing processes to form anatase crystalline phase, and pattern transfer process onto substrate with light illumination. The adhesion of PDMS onto TiO2 substrate is related to the photocatalystic reaction of anatase TiO2 film, which is caused by rapid thermal anneal at least above 300 degrees C. This soft lithographic technique demonstrates the formation of high line and dot patterns simultaneously without any additional adhesion-promotion and time-urgent processes. | - |
dc.language | 영어 | - |
dc.language.iso | en | - |
dc.publisher | ELSEVIER SCIENCE BV | - |
dc.title | Nanoscale patterning using photo-assisted polymer transfer lithography | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Ahn, Jinho | - |
dc.identifier.doi | 10.1016/j.mee.2007.01.208 | - |
dc.identifier.scopusid | 2-s2.0-34247637228 | - |
dc.identifier.wosid | 000247182500193 | - |
dc.identifier.bibliographicCitation | MICROELECTRONIC ENGINEERING, v.84, no.5-8, pp.1511 - 1514 | - |
dc.relation.isPartOf | MICROELECTRONIC ENGINEERING | - |
dc.citation.title | MICROELECTRONIC ENGINEERING | - |
dc.citation.volume | 84 | - |
dc.citation.number | 5-8 | - |
dc.citation.startPage | 1511 | - |
dc.citation.endPage | 1514 | - |
dc.type.rims | ART | - |
dc.type.docType | Article; Proceedings Paper | - |
dc.description.journalClass | 1 | - |
dc.description.isOpenAccess | N | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Engineering | - |
dc.relation.journalResearchArea | Science & Technology - Other Topics | - |
dc.relation.journalResearchArea | Optics | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Engineering, Electrical & Electronic | - |
dc.relation.journalWebOfScienceCategory | Nanoscience & Nanotechnology | - |
dc.relation.journalWebOfScienceCategory | Optics | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.subject.keywordPlus | FILMS | - |
dc.subject.keywordPlus | STAMP | - |
dc.subject.keywordAuthor | soft lithography | - |
dc.subject.keywordAuthor | photo-assisted polymer transfer lithography | - |
dc.subject.keywordAuthor | anatase TiO2 | - |
dc.subject.keywordAuthor | polydimethylsiloxaene | - |
dc.identifier.url | https://www.sciencedirect.com/science/article/pii/S0167931707002031?via%3Dihub | - |
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
222, Wangsimni-ro, Seongdong-gu, Seoul, 04763, Korea+82-2-2220-1365
COPYRIGHT © 2021 HANYANG UNIVERSITY.
Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.
You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.