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Electronic and structural characteristics of diffusion process in Fe/Al(001) and Al/Fe(001) systems

Authors
Kim, ChihoChung, Yong-Chae
Issue Date
Jun-2006
Publisher
JAPAN SOC APPLIED PHYSICS
Keywords
Fe-Al multilayer; ab initio calculation; surface diffusion; incorporation
Citation
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, v.45, no.6B, pp.5578 - 5581
Indexed
SCIE
SCOPUS
Journal Title
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS
Volume
45
Number
6B
Start Page
5578
End Page
5581
URI
https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/181421
DOI
10.1143/JJAP.45.5578
ISSN
0021-4922
Abstract
Diffusion behaviors that occurred in the initial stage of Fe-Al multilayer fabrication were investigated using ab initio pseudopotential calculations. The hollow site was the most stable adsorption site on both Al(001) and Fe(001) surfaces and the calculated energy barriers for the surface diffusion were 0.89eV for Fe/Al(001) and 0.64eV for Al/Fe(001) systems. The energy barrier for,the incorporation of the Fe adatom into the Al substrate was calculated to be 0.38 eV and the energy gain of the system was 0.49 eV. A maximum charge depletion of 0.35 bohr(-3) and a maximum charge accumulation of 0.17 bohr-3 were found in the Fe-Al bonds. The Al adatom required relatively a large energy barrier, i.e., 0.99 eV, for its incorporation into the Fe substrate and the total energy of. the system was increased by 0.13 eV.
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