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Novel hybrid mask mold for combined nanoimprint and photolithography technique
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Moon, Kanghun | - |
| dc.contributor.author | Choi, Banglim | - |
| dc.contributor.author | Park, In-Sung | - |
| dc.contributor.author | Hong, Sunghun | - |
| dc.contributor.author | Yang, Kihyun | - |
| dc.contributor.author | Lee, Heon | - |
| dc.contributor.author | Ahn, Jinho | - |
| dc.date.accessioned | 2022-12-21T11:39:48Z | - |
| dc.date.available | 2022-12-21T11:39:48Z | - |
| dc.date.created | 2022-09-16 | - |
| dc.date.issued | 2006-04 | - |
| dc.identifier.issn | 0167-9317 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/181580 | - |
| dc.description.abstract | We present a combined nanoimprint and photolithography (CNP) process for nano-size patterning to greatly simplify conventional ultraviolet nanoimprint lithography. The mold is a key component for precise patterning with CNP, and a novel hybrid mask mold with SiO2 interlayer and hydrophobic agent treatment is suggested for easy detachment after imprinting. This allows a very simple process to get a complete pattern transfer without any defects. | - |
| dc.language | 영어 | - |
| dc.language.iso | en | - |
| dc.publisher | ELSEVIER SCIENCE BV | - |
| dc.title | Novel hybrid mask mold for combined nanoimprint and photolithography technique | - |
| dc.type | Article | - |
| dc.contributor.affiliatedAuthor | Ahn, Jinho | - |
| dc.identifier.doi | 10.1016/j.mee.2006.01.055 | - |
| dc.identifier.scopusid | 2-s2.0-33748256723 | - |
| dc.identifier.wosid | 000237581900066 | - |
| dc.identifier.bibliographicCitation | MICROELECTRONIC ENGINEERING, v.83, no.4-9, pp.889 - 892 | - |
| dc.relation.isPartOf | MICROELECTRONIC ENGINEERING | - |
| dc.citation.title | MICROELECTRONIC ENGINEERING | - |
| dc.citation.volume | 83 | - |
| dc.citation.number | 4-9 | - |
| dc.citation.startPage | 889 | - |
| dc.citation.endPage | 892 | - |
| dc.type.rims | ART | - |
| dc.type.docType | Article; Proceedings Paper | - |
| dc.description.journalClass | 1 | - |
| dc.description.isOpenAccess | N | - |
| dc.description.journalRegisteredClass | scie | - |
| dc.description.journalRegisteredClass | scopus | - |
| dc.relation.journalResearchArea | Engineering | - |
| dc.relation.journalResearchArea | Science & Technology - Other Topics | - |
| dc.relation.journalResearchArea | Optics | - |
| dc.relation.journalResearchArea | Physics | - |
| dc.relation.journalWebOfScienceCategory | Engineering, Electrical & Electronic | - |
| dc.relation.journalWebOfScienceCategory | Nanoscience & Nanotechnology | - |
| dc.relation.journalWebOfScienceCategory | Optics | - |
| dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
| dc.subject.keywordPlus | FLASH IMPRINT LITHOGRAPHY | - |
| dc.subject.keywordPlus | STEP | - |
| dc.subject.keywordAuthor | nanoimprint lithography | - |
| dc.subject.keywordAuthor | photolithography | - |
| dc.subject.keywordAuthor | hybrid mask mold | - |
| dc.subject.keywordAuthor | anti-sticking property | - |
| dc.identifier.url | https://www.sciencedirect.com/science/article/pii/S016793170600030X?via%3Dihub | - |
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Related Researcher
- Ahn, Jinho
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)