Detailed Information

Cited 0 time in webofscience Cited 0 time in scopus
Metadata Downloads

Bi and Te thin films synthesized by galvanic displacement from acidic nitric baths

Authors
Chang, Chong HyunRheem, YoungwooChoa, Yong-HoShin, Dong HyukPark, Deok-YongMyung, Nosang V.
Issue Date
Jan-2010
Publisher
Pergamon Press Ltd.
Keywords
Galvanic displacement; Electroless deposition; Bismuth; Tellurium; Thermoelectric materials
Citation
Electrochimica Acta, v.55, no.3, pp.743 - 752
Indexed
SCIE
SCOPUS
Journal Title
Electrochimica Acta
Volume
55
Number
3
Start Page
743
End Page
752
URI
https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/182000
DOI
10.1016/j.electacta.2009.09.038
ISSN
0013-4686
Abstract
Bismuth (Bi) and tellurium (Te) thin films were formed by galvanic displacement of different sacrificial iron group thin films [i.e. nickel (Ni), cobalt (Co) and iron (Fe)] where the formation was systematically investigated by monitoring the change of open circuit potential (OCP), surface morphology and microstructure. The surface morphologies and crystal structures of galvanically displaced Bi or Te thin films strongly depended on the type and thickness of the sacrificial materials. Continuous Bi thin films were successfully deposited with the sacrificial Co. However, dendrites and nanoplatelets were formed from the Ni and Fe thin films. Te thin films were synthesized with all the three sacrificial thin films. Chemical dissolution rate of the sacrificial thin films and mixed potential strongly influenced formation of Bi or Te thin films. (C) 2009 Elsevier Ltd. All rights reserved.
Files in This Item
Go to Link
Appears in
Collections
ETC > 1. Journal Articles

qrcode

Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.

Altmetrics

Total Views & Downloads

BROWSE