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Growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tim oxide by atomic layer deposition
- Authors
- 박진성
- Issue Date
- 27-May-2022
- Publisher
- 한국반도체디스플레이기술학회
- Citation
- 2022년 반도체디스플레이기술학회 춘계학술대회
- Conference Name
- 2022년 반도체디스플레이기술학회 춘계학술대회
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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Related Researcher
- Park, Jinseong
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)