Detailed Information
Cited 0 time in 
Cited 0 time in 
Cited 0 time in
Metadata Downloads
Study of Silicon Oxynitride Thin Films by Plasma-enhanced Atomic Layer Deposition using a Tetraisocyanatesilane (TICS) and N2 plasma
- Authors
- 박진성
- Issue Date
- 14-Nov-2022
- Publisher
- 한국반도체디스플레이기술학회
- Citation
- KISM 2022
- Conference Name
- KISM 2022
- Files in This Item
- There are no files associated with this item.
- Appears in
Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
Related Researcher
- Park, Jinseong
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)