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Plasma Ashing of Low-k Dielectric Films by using the Ferrite-Core Technologies

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dc.contributor.author김현우-
dc.date.accessioned2023-04-03T17:54:53Z-
dc.date.available2023-04-03T17:54:53Z-
dc.date.created2023-02-11-
dc.date.issued2022-11-14-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/183685-
dc.publisherThe Korean Society of Semiconductor & Display Technology (KSDT)-
dc.titlePlasma Ashing of Low-k Dielectric Films by using the Ferrite-Core Technologies-
dc.typeConference-
dc.contributor.affiliatedAuthor김현우-
dc.identifier.bibliographicCitation2022 KISM Korean International Semiconductor Conference on Manufacturing Technology 2022-
dc.relation.isPartOf2022 KISM Korean International Semiconductor Conference on Manufacturing Technology 2022-
dc.citation.title2022 KISM Korean International Semiconductor Conference on Manufacturing Technology 2022-
dc.citation.conferencePlace파라다이스 호텔 부산 해운대-
dc.type.rimsCONF-
dc.description.journalClass1-
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