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Plasma Ashing of Low-k Dielectric Films by using the Ferrite-Core Technologies

Authors
김현우
Issue Date
14-Nov-2022
Publisher
The Korean Society of Semiconductor & Display Technology (KSDT)
Citation
2022 KISM Korean International Semiconductor Conference on Manufacturing Technology 2022
URI
https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/183685
Conference Name
2022 KISM Korean International Semiconductor Conference on Manufacturing Technology 2022
Place
파라다이스 호텔 부산 해운대
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서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers

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Kim, Hyoun Woo
COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)
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