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Alternative Metal Gate by Incorporating AlN into ALD TaN using TBTDET and TaCl5 Precursors

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dc.contributor.author최창환-
dc.date.accessioned2023-04-03T18:04:00Z-
dc.date.available2023-04-03T18:04:00Z-
dc.date.created2023-02-11-
dc.date.issued2022-01-19-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/183866-
dc.publisher나노기술연구협의회-
dc.titleAlternative Metal Gate by Incorporating AlN into ALD TaN using TBTDET and TaCl5 Precursors-
dc.typeConference-
dc.contributor.affiliatedAuthor최창환-
dc.identifier.bibliographicCitationNano Convergence Conference (NCC)-
dc.relation.isPartOfNano Convergence Conference (NCC)-
dc.citation.titleNano Convergence Conference (NCC)-
dc.citation.conferencePlace강원도 하이원 그랜드 호텔-
dc.type.rimsCONF-
dc.description.journalClass2-
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서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers

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