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Development of high ion density and uniformity plasma source for large scale descum processing
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 정진욱 | - |
| dc.date.accessioned | 2023-07-05T06:55:51Z | - |
| dc.date.available | 2023-07-05T06:55:51Z | - |
| dc.date.issued | 2022-11-10 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/186930 | - |
| dc.title | Development of high ion density and uniformity plasma source for large scale descum processing | - |
| dc.type | Conference | - |
| dc.citation.conferenceName | The 20th international Symposium on Microelectronics and Packagin | - |
| dc.citation.conferencePlace | 한화리조트(부산) | - |
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Collections - 서울 공과대학 > 서울 전기공학전공 > 2. Conference Papers
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Related Researcher
- Chung, Chin Wook
- COLLEGE OF ENGINEERING (MAJOR IN ELECTRICAL ENGINEERING)