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Electron-assisted PR etching in an inductivley coupled oxygen plasma via low-energy electron beam
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 정진욱 | - |
| dc.date.accessioned | 2023-07-05T06:55:55Z | - |
| dc.date.available | 2023-07-05T06:55:55Z | - |
| dc.date.issued | 2022-11-14 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/186931 | - |
| dc.title | Electron-assisted PR etching in an inductivley coupled oxygen plasma via low-energy electron beam | - |
| dc.type | Conference | - |
| dc.citation.conferenceName | Korean international semiconductor conference on manufacturing technology 2022 | - |
| dc.citation.conferencePlace | 파라다이스호텔(부산) | - |
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Collections - 서울 공과대학 > 서울 전기공학전공 > 2. Conference Papers
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Related Researcher
- Chung, Chin Wook
- COLLEGE OF ENGINEERING (MAJOR IN ELECTRICAL ENGINEERING)