Actinic patterned mask imaging using extreme ultraviolet ptychography microscope with high harmonic generation source
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kim, Young Woong | - |
dc.contributor.author | Lee, Dong Gi | - |
dc.contributor.author | Moon, Seungchan | - |
dc.contributor.author | Ku, Chang Mo | - |
dc.contributor.author | Cho, Joong Hwee | - |
dc.contributor.author | Ahn, Jinho | - |
dc.date.accessioned | 2023-09-26T08:49:49Z | - |
dc.date.available | 2023-09-26T08:49:49Z | - |
dc.date.created | 2022-06-29 | - |
dc.date.issued | 2022-07 | - |
dc.identifier.issn | 1882-0778 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/191206 | - |
dc.description.abstract | Extreme ultraviolet (EUV) lithography is expected to be used for 3 nm technology nodes and beyond, yet the need for actinic mask metrology and inspection remains a critical challenge. In this study, we demonstrate an EUV ptychography microscope as a high-harmonic generation-based actinic mask imaging tool. A series of diffraction patterns on an EUV mask is used to reconstruct both the amplitude and phase information of the periodic patterns using ptychographic algorithms. The results show that the EUV ptychography microscope has the potential for determining the actinic metrology of EUV masks and providing phase information for EUV mask development. | - |
dc.language | 영어 | - |
dc.language.iso | en | - |
dc.publisher | IOP Publishing Ltd | - |
dc.title | Actinic patterned mask imaging using extreme ultraviolet ptychography microscope with high harmonic generation source | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Ahn, Jinho | - |
dc.identifier.doi | 10.35848/1882-0786/ac7699 | - |
dc.identifier.scopusid | 2-s2.0-85132994670 | - |
dc.identifier.wosid | 000812420300001 | - |
dc.identifier.bibliographicCitation | APPLIED PHYSICS EXPRESS, v.15, no.7, pp.1 - 5 | - |
dc.relation.isPartOf | APPLIED PHYSICS EXPRESS | - |
dc.citation.title | APPLIED PHYSICS EXPRESS | - |
dc.citation.volume | 15 | - |
dc.citation.number | 7 | - |
dc.citation.startPage | 1 | - |
dc.citation.endPage | 5 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.isOpenAccess | N | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.subject.keywordPlus | Actinic | - |
dc.subject.keywordPlus | Extreme ultra-violet lithographies | - |
dc.subject.keywordPlus | Extreme Ultraviolet | - |
dc.subject.keywordPlus | Extreme ultraviolet masks | - |
dc.subject.keywordPlus | High harmonic generation | - |
dc.subject.keywordPlus | Mask inspection | - |
dc.subject.keywordPlus | Mask metrology | - |
dc.subject.keywordPlus | Phase information | - |
dc.subject.keywordPlus | Ptychography | - |
dc.subject.keywordPlus | Technology nodes | - |
dc.subject.keywordAuthor | actinic | - |
dc.subject.keywordAuthor | extreme ultraviolet lithography | - |
dc.subject.keywordAuthor | high harmonic generation | - |
dc.subject.keywordAuthor | metrology | - |
dc.subject.keywordAuthor | photomask | - |
dc.subject.keywordAuthor | ptychography | - |
dc.identifier.url | https://iopscience.iop.org/article/10.35848/1882-0786/ac7699 | - |
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