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Nonvolatile Memory Effects of ZnO Nanoparticles Embedded in an Amorphous Carbon Layer

Authors
Li, FushanShakerzadeh, MaziarTay, BengkangGuo, TailiangKim, Taewhan
Issue Date
Jul-2010
Publisher
IOP PUBLISHING LTD
Citation
JAPANESE JOURNAL OF APPLIED PHYSICS, v.49, no.7, pp 1 - 3
Pages
3
Indexed
SCI
SCIE
SCOPUS
Journal Title
JAPANESE JOURNAL OF APPLIED PHYSICS
Volume
49
Number
7
Start Page
1
End Page
3
URI
https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/193909
DOI
10.1143/JJAP.49.070209
ISSN
0021-4922
1347-4065
Abstract
Nonvolatile memory devices utilizing ZnO nanoparticles (NPs) embedded in an amorphous carbon (a-C) dielectric layer were investigated by capacitance-voltage (C-V) measurements. C-V curves for the Al/ZnO NPs embedded in an amorphous carbon layer/SiO2/p-Si capacitor at 298 K showed a clockwise hysteresis with flat band voltage shift due to charge trapping in the ZnO NPs. Capacitance-time measurements showed that the devices exhibited excellent memory retention ability under ambient conditions. Operating mechanism for the memory devices was proposed based on the C-V results.
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