Determining the thickness of semi-transparent thin films via reflectivity measurements based on optical propertiesDetermining the thickness of semitransparent thin films via reflectivity measurements based on optical properties
- Other Titles
- Determining the thickness of semitransparent thin films via reflectivity measurements based on optical properties
- Authors
- Hwang, Jong Jin; Lee, Hee-Lak; Ryu, Choong-Mo; Park, Jiyoung; Moon, Seung Jae
- Issue Date
- Jul-2024
- Publisher
- Korean Society of Mechanical Engineers
- Keywords
- Laser; Nitride film; Oxide film; Thickness measurement
- Citation
- Journal of Mechanical Science and Technology, v.38, no.7, pp 3557 - 3562
- Pages
- 6
- Indexed
- SCIE
SCOPUS
KCI
- Journal Title
- Journal of Mechanical Science and Technology
- Volume
- 38
- Number
- 7
- Start Page
- 3557
- End Page
- 3562
- URI
- https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/194929
- DOI
- 10.1007/s12206-024-0628-5
- ISSN
- 1738-494X
1976-3824
- Abstract
- This study addresses the challenge of measuring deposited film thickness during semiconductor manufacturing in real-time. Accordingly, we present the development of a sensor capable of measuring the deposition and growth thickness of wafers within a chamber in situ. Using a laser measurement instrument, we designed a sensor equipped with a light-receiving component to capture the reflected light signals. Our experimental results confirm the feasibility of real-time measurements; the oxide and nitride films are measured with a deviation of 10 nm or less and a minimum error factor as low as 0.68 %. This sensor is promising for improving the efficiency and accuracy of film thickness measurements in semiconductor manufacturing processes.
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