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Terahertz conductivity of high-quality indium films deposited using a substrate cooling methodTerahertz conductivity of high-quality indium films deposited using a substrate cooling method

Other Titles
Terahertz conductivity of high-quality indium films deposited using a substrate cooling method
Authors
Choi, GeunchangChoi, Dong-HwanRyeom, JunhoPark, Dae YoungKim, Wu-SinKim, Ju-JinBahk, Young-MiJeong, Mun Seok
Issue Date
Aug-2023
Publisher
Elsevier B.V.
Keywords
Indium thin film; Terahertz conductivity; Terahertz time-domain spectroscopy
Citation
Current Applied Physics, v.52, pp 80 - 84
Pages
5
Indexed
SCIE
SCOPUS
KCI
Journal Title
Current Applied Physics
Volume
52
Start Page
80
End Page
84
URI
https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/196468
DOI
10.1016/j.cap.2023.05.004
ISSN
1567-1739
1878-1675
Abstract
High-quality indium thin films were fabricated by substrate cooling method during the metal deposition. The cooling effect reduced the threshold thickness for insulator-to-metal transition, which originates from the interconnections between the indium nano-islands. The complex conductivities of the films were measured by terahertz time-domain spectroscopy. We showed that the conductivity of the indium films prepared by substrate cooling were ∼10 times higher than that deposited at room temperature, even though thickness of the former was lower than that of the latter film. Our results suggest that substrate cooling is promising for the applications of metal thin films and contacts.
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