Detailed Information
Cited 0 time in 
Cited 0 time in 
Cited 0 time in
Metadata Downloads
EUV 펠리클에 포집된 임계 크기의 입자가 마스크 이미지 전사특성에 미치는 영향에 대한 실험적 연구
- Authors
- 안진호
- Issue Date
- 24-Jan-2024
- Place
- 경주화백컨벤션센터
- Conference Name
- The 31th Korean Conference on Semiconductors
- Files in This Item
- There are no files associated with this item.
- Appears in
Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
Related Researcher
- Ahn, Jinho
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)