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Fizeau interferometry를 이용한 EUV attenuated phase shift mask 평가 기술 연구
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 안진호 | - |
| dc.date.accessioned | 2024-12-01T11:30:24Z | - |
| dc.date.available | 2024-12-01T11:30:24Z | - |
| dc.date.issued | 2024-01-26 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/198921 | - |
| dc.title | Fizeau interferometry를 이용한 EUV attenuated phase shift mask 평가 기술 연구 | - |
| dc.type | Conference | - |
| dc.citation.conferenceName | The 31th Korean Conference on Semiconductors | - |
| dc.citation.conferencePlace | 경주화백컨벤션센터 | - |
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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Related Researcher
- Ahn, Jinho
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)