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Enhancing Hydrogen-Resistance and Stability in IGZO-TFTs using Al2O3 Gate Insulators with N2O Plasma Reactant
- Authors
- 박진성
- Issue Date
- 21-Aug-2024
- Place
- ICC Jeju, Jeju, Korea
- Conference Name
- IMID 2024
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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Related Researcher
- Park, Jinseong
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)